Lasair Pro 310
Standard handheld for ISO 5-8 optics cleanroom audits, HVAC validation and ISO 14644-1 certification. Fast-charging lithium battery, 5,000-location memory.
Protect precision optics, lens/mirror cleanrooms, sensors and laser sources from submicron contamination — the shorter the wavelength and the higher the laser energy density, the more any particle can destroy a component. Particle Measuring Systems keeps your optics cleanroom perfectly clean — officially distributed in Vietnam by Techmaster.
“Solution hub for particle measurement in optics, laser, lens, mirror and photonics-sensor cleanrooms Vietnam — Lasair Pro, Lasair III, IsoAir Pro, NanoAir 10, Chem 20, AirSentry II AMC.”
From DUV/EUV lithography optics to lens grinding, mirror coating, laser assembly and sensor packaging — Techmaster recommends the optimal configuration for Vietnam’s optics industry.
Lightweight rechargeable handhelds — built for HVAC validation, ISO 14644 spot-checks, and certification of coating rooms, lens assembly and sensor packaging rooms.
Standard handheld for ISO 5-8 optics cleanroom audits, HVAC validation and ISO 14644-1 certification. Fast-charging lithium battery, 5,000-location memory.
50 LPM handheld — twice as fast as the 310 version. Ideal for auditing multiple lens-grinding rooms, coating chambers and laser rooms in a single shift.
100 LPM flow — classify an entire optics plant in one shift. Built for large-scale optics plants, sensor packaging and fiber optic production.
Fixed or trolley, sensitivity from 0.1 µm — required for DUV/EUV lithography optics, telescope mirrors, precision lenses and critical laser sources.
The highest 0.1 µm-sensitivity particle counter — the standard for DUV/EUV lithography lenses, mirror sub-aperture polishing and critical sensors. Meets laser damage threshold requirements.
6 measurement channels (0.3, 0.5, 1.0, 5.0, 10 µm) for lens coating, laser optics assembly and fiber alignment. Balances sensitivity and cost for 90% of photonics applications.
50 LPM flow (vs the standard 28.3 LPM) — cuts sampling time by 40% for large-volume optics cleanrooms, sampling 20+ locations per ISO 14644-1.
Integrates with FacilityPro FMS with continuous data streaming — 24/7 monitoring of lens coating chambers, laser source rooms and sensor packaging, with instant alarms.
Fixed counter with Ethernet connectivity for optics plants with existing cabling. Integrates with FMS via TCP/IP, OPC UA, BACnet for lithography lines and critical optics rooms.
Wireless for photonics cleanrooms — no cabling through vibration-sensitive areas required, flexible deployment for laser rooms, AES-encrypted 2.4 GHz. Saves 70% of cabling cost.
Entry-level option for optics R&D, prototype lens and optics lab projects on tighter budgets. Still delivers PMS reliability at an optimized investment cost.
An ultra-high-sensitivity 10 nm CPC for EUV photonics R&D, and the lightest handheld for fast audits in fiber optics and sensor module assembly.
10 nm-sensitivity particle counter for EUV lithography optics R&D, advanced laser sources and ultra-high-reflectivity mirror coating. The only one on the market — the standard for next-gen photonics.
The lightest handheld at an economical price for fast audits of fiber optic assembly, sensor modules and R&D laser labs. Under 1 kg, 8-hour battery, XML/PDF report output.
4-size-channel networked particle sensor — deploy facility-wide for display panels, fiber optic factories and lens-grinding workshops. Lowest cost per measurement channel.
Particle measurement in DI water for lens rinsing, photoresist chemicals and coating solutions, plus AMC monitoring of ammonia/sulfate that causes laser damage and haze on optics.
20 nm particle counter in chemical liquids — the standard for photonics photoresist, optical coating solutions and sensor wet chemistry. Detects submicron contamination before it causes defects.
AMC (Airborne Molecular Contamination) monitoring for DUV/EUV lithography lenses, mirror haze prevention and laser damage threshold — catches ammonia, acid and sulfate at ppt level.
UPW ultrapure-water particle counting for lens cleaning, mirror rinse and sensor surface preparation. The same technology used for 7nm semiconductor UPW systems.
Each ISO 14644 class has its own particle limits — short wavelengths and high laser power demand the most critical cleanrooms, so choose the right counter up front to prevent laser damage and haze.
DUV/EUV lenses, EUV mirror coating, high-power laser cavities. Requires 0.1 µm detection and a 10 nm CPC. The most critical cleanroom.
Lens grinding, mirror polishing, optical coating chambers, sensor wafer bonding. Balances 0.3 µm sensitivity and cost.
Fiber optic alignment, display panel assembly, camera module packaging. Lower requirements — prioritizes economy and sensor density.
PMS FMS systems monitor the entire optics plant — from lens grinding to laser packaging, with data-integrity audit trail, real-time alarms and automated reporting for ISO 14644, ISO 21501-4 and OEM customer requirements.
Techmaster Vietnam engineers provide free configuration consulting, on-site demos, and turnkey FMS proposals for lens grinding, mirror coating, laser source, sensor packaging, fiber optic and display panel cleanrooms.